The company's technical team has experience in ultra-high vacuum MBE equipment, high vacuum magnetron sputtering equipment and ALD equipment, and has different solutions for vacuum acquisition and vacuum measurement technology.
The control and adjustment technology of surface temperature of heater, pedal or susceptor can control the susceptor temperature to + / - 1 ℃ at high temperature (850c). The team has many years of experience in the selection of temperature controllers and the in-depth development of temperature control algorithms.
The technical team has been engaged in the design and development of PVD, PECVD, MOCVD and ALD equipment for many years, and has rich experience in the control of gas flow, thermal field, film deposition thickness, material resistance, dielectric constant or stress
Vacuum high-pressure defoaming is based on Henry's law and the relationship between the viscosity and temperature of the material. Through the combination of high pressure and vacuum, the large and small bubbles in the material are eliminated, thus ensuring the life and reliability of the chip
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